Architecture Studio: Shanghai

14.06.2010 - 02.07.2010

2/F, 298 North Suzhou Road, Hong Kou District, Shanghai, China

Architecture Studio Shanghai is a three-week program held at The University of Hong Kong Faculty of Architecture Study Centre, at the center of Shanghai.A fundamental element of the course is to introduce students to architectural issues and design practices, in contemporary China. The studio topic is embedded in the context of Shanghai and addresses contemporary issues in architecture and urbanism.

The structure of the workshop is coordinated around a studio-based core accompanied by short lecture courses covering issues in Chinese architectural history, architectural theory and computational technology. The program is taught in English. The HKU Study Centre provides state-of-the-art studio space in the heart of Shanghai. Field trips to significant architectural sites and visits to local and international design firms will provide participants with a broad view of contemporary Chinese culture, architecture and urbanism. Students work closely with the teaching staff, using the dynamic city of Shanghai as a context for understanding architecture's role in the built environment.

Enrollment:
Applicants who are interested to enroll should have completed at least two undergraduate or graduate level design studios in, or be a recent graduate of, an accredited school of architecture. Enrollment is limited to 50 students. The comprehensive course is designed to augment participants architectural studies at home with a rigorous international experience. This is a university level course and The University of Hong Kong will assist participants to transfer college credits to their home university.

Tuition:
The fee for the summer program is US$3,000, covering the cost of the program in Shanghai (field trips, admissions, etc). It does not include flights or accommodation. Accommodation can be arranged for additional costs at a reasonably priced four-star hotel adjacent to the Shanghai Study Centre.

Registration:
Deadline for registration is June 1, 2010. Online registration is required.